[1] Quirk M, Serda J. Semiconductor Manufacturing Technology[M]. Publishing House of Electronics Industry, 2006:369-381.
[2] Seo M,Kim H,Park M. Maskless lithographic pattern generation system upon micromirrors[J]. Computer-Aided Design and Applications,2006,3(1/4):185-192.
[3] Gao Y, Shen T, Chen J, et al. Research on high-quality projecting reduction lithography system based on digital mask technique[J]. Optik-International Journal for Light and Electron Optics, 2005, 116(7): 303-310.
[4] Fang Peiming. Development situation of LED floodlight[J]. Electronic Products, 2007,12: 62-64(in Chinese).
[5] Lin Qinghua, Li Wenjing, Song Chao, et al. Design of the illumination system for laser projection lithography[J]. Journal of Guangdong University of Technology(广东工业大学学报), 2007, 24(2):33-35(in Chinese).
[6] Pei Wenyan, Zhou Jinyun, Liang Guojun, et al. Uniformity analysis of the illumination system for PCB laser projection image[J]. Chinese Journal of Quantum Electronics(量子电子学报), 2009, 26(3): 360-365(in Chinese).
[7] Blake G, Donald G, Joseph M, et al. A fly’s eye conderser system for uniform illumination[J]. OSA/IODC, 2002, 13(8): 130-131.
[8] Wang Peipei, Yang Xibing, Zhu Fengjian, et al. Design and analysis on large area uniform illumination with fly-eye lens[J]. Journal of Applied Optics(应用光学), 2014, 5: 771-777,778(in Chinese).
[9] Wang Guogui, Gao Yiqing, Xiao Mengchao, et al. New research progress in UV-LED lithography light source system[J]. China Illuminating Engineering Journal(照明工程学报), 2013, 24(2): 53-57(in Chinese).
[10] Liu Pengfei, Yang Bo, Lu Kan, et al. Design and research on the uniform illumination system of UV exposure machine[J]. Optical Instruments, 2012, 34(2): 31-36(in Chinese).
[11] Zhou Shuwen, Lin Jinbo. Uniformity of the illumination system with fly′s eye lens[J]. Journal of Zhejiang University(浙江大学学报), 1986, 20(5): 130-136(in Chinese).
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