光网络中分光探测器薄膜的研制

量子电子学报

光网络中分光探测器薄膜的研制

石澎*1，毕君2,张功3，张于帅3，王丽荣1

1中山火炬职业技术学院光电工程系，广东中山 528436；2 广州市光机电研究所，广东广州510663 3 长春理工大学光电工程学院，吉林长春 130022

出版日期:2019-05-28 发布日期:2019-05-14
作者简介:石澎（1983-），男，山东省苍山县，在读博士，讲师，主要从事光学薄膜和发光材料方面的研究。E-mail: 252850182@qq.com
基金资助:
Key Program of Jilin Province Sience and Technology Plan of China 吉林省重大科技攻关专项(20140203002GX)；Program of Sience and Technology Plan of Zhongshan City of China广东省中山市科技项目（2016B2182）

Study and Fabrication of Beam-splitting Photodetector Film in optical networks

SHI Peng1，2，BI Jun3,ZHANG gong4，ZHANG Yushuai4，WANG Lirong1

1 Department of Optoelectronic Engineering, Zhongshan Torch Polytechnic, Zhongshan 528436, China;2 Guangzhou Research Institute of Optics-Mechanics-Electricity Technology ,Guangzhou,510663,China;3 School of Optics and Electric Engineering, Changchun University of Science and Technology,Changchun 130022,China

Published:2019-05-28 Online:2019-05-14

摘要/Abstract

摘要： 光通讯网络监控系统中的分光探测器用于检测光信号的流量，在通信和信号检测领域具有非常广泛的应用。为满足器件使用需求，本文采用离子束辅助沉积（IBAD）技术，对在1260～1620 nm波长范围内透射、反射能量分光比为50:50的分光探测器薄膜进行了研制。主要分析并解决了镀膜材料光学常数计算的问题，通过建立误差函数，优化并降低镀膜材料光学常数计算的误差。在设计分光探测器薄膜时，通过增加虚设层来平滑光谱曲线，同时降低膜厚的敏感度，即降低制备工艺的难度。制备的分光探测器薄膜在1260～1620 nm波长范围内透射、反射分光比小于50:50(±0.5%)，满足分光探测器指标参数要求。

关键词: 薄膜光学, 分光探测器薄膜, 虚设层, 分光比

Abstract: Beam-splitting photodetectors in optical communication network monitoring systems are used to detect the flow of optical signals and have a large number of applications in the field of communication and signals detect. In order to meet the device usage requirements, a beam-splitting photodetector film was developed.Its transmission and reflection energy splitting ration is 50:50 in the wavelength range of 1520～1620 nm with the IBAD technology.The optical constants calculation of coating material were analyzed and calculated.By establishing the error function, the error of optical constant of coated material was optimized and reduced. In the design of beam-splitting photodetector film, the spectrum curve was smoothed by adding the dummy layer, and the sensitivity of the layer thickness was reduced.As a result,the difficulty of the preparation process was reduced. The transmittance and reflection splitting ration of the prepared beam-splitting photodetector film in the wavelength range 1260～1620 nm is less than 50:50(±0.5%), which meets the requirements of the parameters.

Key words: thin film optics, beam-splitting photodetector film, dummy layer, splitting ratio

石澎*1，毕君2,张功3，张于帅3，王丽荣1. 光网络中分光探测器薄膜的研制[J]. 量子电子学报.

SHI Peng1，2，BI Jun3,ZHANG gong4，ZHANG Yushuai4，WANG Lirong1. Study and Fabrication of Beam-splitting Photodetector Film in optical networks[J]. Chinese Journal of Quantum Electronics.

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