J4 ›› 2017, Vol. 34 ›› Issue (1): 106-112.

• 半导体光电 • 上一篇    下一篇

强电场对NiO电子结构性质的影响研究

李凡生1,余小英1*,彭金云2, 房 慧1,张飞鹏3,张 忻4   

  1. 1 广西民族师范学院物理与电子工程系,广西 崇左 532200; 2 广西民族师范学院化学与生物工程系,广西 崇左 532200; 3 河南城建学院数理学院,建筑光伏一体化河南省工程实验室,河南 平顶山 467036; 4 北京工业大学材料科学与工程学院,新型功能材料教育部重点实验室,北京 100124
  • 收稿日期:2015-12-31 修回日期:2016-04-25 出版日期:2017-01-28 发布日期:2017-01-28
  • 通讯作者: 李凡生(1974 - )硕士,副教授,主要从事凝聚态物理与实验方面的研究。 E-mail: 414269867@qq.com
  • 基金资助:
    Supported by National Natural Science Foundation of China(国家自然科学基金, 11347141, 21465004, 51572066), Natural Science Foundation of Guangxi Province(广西省自然科学基金, 2015GXNSFBA139014)

Influence of strong electric field on electronic structure properties of NiO

LI Fansheng1, YU Xiaoying1*, PENG Jinyun2, FANG Hui1, ZHANG Feipeng3,Zhang Xin4   

  1. 1 Department of Physics and Electronic Engineering, Guangxi Normal University for Nationalities, Chongzuo 532200, China; 2 Department of Chemistry and Biological Engineering, Guangxi Normal University for Nationalities, Chongzuo 532200, China; 3 Henan Provincial Engineering Laboratory of Building-Photovoltaics, School of Mathematics and Physics, Henan University of Urban Construction, Pingdingshan 467036, China; 4 Key Laboratory of Advanced Functional Materials, Chinese Ministry of Education, College of Materials Science and Engineering, Beijing University of Technology, Beijing 100124, China
  • Received:2015-12-31 Revised:2016-04-25 Published:2017-01-28 Online:2017-01-28

摘要: 基于平面波密度泛函理论研究了电场强度为10V?nm-1下立方结构氧化镍的电子结构性质。结果表明:立方相氧化镍在电场强度10V?nm-1下呈现导体的能带结构,价带上移到导带,态密度谱图在多个能量取得最值,局域化效应增强,费米能级附近的态密度增大为原系统的2倍多。费米能级上的载流子浓度由4 e/eV增大到15 e/eV,这源于Op、Nis、Nid态对费米面的贡献。强电场下的电子在不同量子状态之间显示了明显的转移,介电函数计算表明强电场下体系在0.32 eV附近具有最大的吸收,吸收峰峰值66.89。强电场明显调控了NiO的电学、光学和场致光吸收性能。

关键词: 光电子学;立方氧化镍;强电场;电子结构

Abstract: The electronic structure properties of the cubic structure nickel oxide at high electric field intensity of 10V?nm-1 are investigated based on plane wave density functional theory. Results show that the cubic nickel oxide exhibits conductor energy band structure at electric field intensity of 10V?nm-1, the valance bands move up to conduction bands, and state density spectrum curves obtain peak values at several energies. The localization effect increases, and the state density near Fermi level increases to more than two times as much as that of the parent system. The carrier concentration at Fermi level increase from 4e/eV to 15e/eV, which is due to the contritution of Op, Nis, Nid state to Fermi surface. Electrons in a strong electric field show an obvious transition between different quantum states, and the dielectric function calculation shows that the system has the maximum absorption with peak value of 66.89 at 0.32 eV under strong electric field. The electrical, optical and field induced optical absorption properties of NiO are obviously controlled by high electric field.

Key words: optoelectronics; cubic NiO;high electrical field; electronic structure

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