极紫外光刻掩模成像和缺陷补偿策略研究进展 (封面文章）
赵 敏, 辛 颖, 匡尚奇
Research progress on mask imaging and defect compensation strategies for extreme ultraviolet lithography (Cover Paper)
ZHAO Min, XIN Ying, KUANG Shangqi
量子电子学报
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2025, (6): 733
-749
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DOI: 10.3969/j.issn.1007-5461.2025.06.001