Control of substrate reflectivity in hyper numerical aperture lithography

J4 ›› 2011, Vol. 28 ›› Issue (6): 730-736.

• Laser Applications • Previous Articles Next Articles

Control of substrate reflectivity in hyper numerical aperture lithography

ZHOU Yuan^1,2, LIU An-ling^1,2, LIU Guang-can^1,2

1 Department of Electronic and Communication Engineering, Changsha University , Changsha 410003, China;
2 Optoelectronic Information Technology Innovative Research Team, Changsha University, Changsha 410003, China

Received:2011-02-14 Revised:2011-03-25 Published:2011-11-28 Online:2011-11-14

Abstract

Abstract:

Substrate reflectivity needs to be controled to reduce the impact of thin-film interference on lithography performance in hyper numerical aperture (NA) lithography. Based on thin film optics method, The control of substrate reflectivity with bottom antireflection coating (BARC) was studied for hyper-NA lithography. Single-layer and dual-layer BARC on a silicon substrate were optimized to investigate the margins of BARC’s optical parameters which meet the requirements of hyper-NA lithography. It is found that single-layer BARC fails to control substrate reflectivity when NA is more than 0.8 and dual-layer BARCs become essential. The substrate reflectivity of TE wave is more uncontrollable as compared to TM wave. The optimized values of refractive index for single-layer BARC grow as the NA increases. In a dual-BARC structure, the top layer should be low absorptive while the bottom one should be high absorptive. This work provides theory base for the research of BARC materials and the control of substrate reflectivity in hyper-NA lithography.

Key words: thin film optics ; substrate reflectivity; bottom antireflection coating optimization; hyper-numerical aperture lithography

CLC Number:

TN305.8

ZHOU Yuan, LIU Anling, LIU Guangcan. Control of substrate reflectivity in hyper numerical aperture lithography[J]. J4, 2011, 28(6): 730-736.

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Control of substrate reflectivity in hyper numerical aperture lithography

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