Alignment technology using matched filter correlation in projection lithography

Abstract

Abstract:

A pattern recognition named phase-only matched filtering is presented to realize high precision alignment in projecting lithography. The method achieves the alignment with the characteristic direction of templates and silicon substrate using the coherent peak rotating sensitive feature in the filter, meanwhile the relative translation distance of templates and silicon substrate is obtained in recognition algorithms. Such an alignment system is assembled in our mature projection lithography machine, and we got the experimental data to prove the higher accuracy and efficiency compared with conventional algorithms.

Key words: laser techniques, lithography, alignment technology, pattern recognition, phase-only matched filtering

CLC Number:

TN23，TN29

Lei Liang, Li Langlin, Zhou Jinyun, Wang Qu. Alignment technology using matched filter correlation in projection lithography[J]. J4, 2012, 29(6): 764-768.

References

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