J4 ›› 2011, Vol. 28 ›› Issue (2): 247-252.

• 第二届全国光学青年学术论坛论文选登 • 上一篇    

溶胶凝胶法制备钼掺杂氧化锌薄膜及性质研究

邵景珍1 董伟伟1,2 陶汝华1,2 邓赞红1,2 周曙1 方晓东1,2   

  1. 1 中国科学院安徽光学精密机械研究所,安徽省光子器件与材料重点实验室,安徽 合肥 230031;
    2 中国科学院新型薄膜太阳能电池重点实验室,安徽 合肥 230031
  • 发布日期:2011-03-03
  • 通讯作者: 方晓东,研究员,博士生导师,主要从事功能氧化物薄膜和准分子技术的研究工作。 E-mail:xdfang@aiofm.ac.cn
  • 作者简介:邵景珍,博士研究生,主要从事光电功能薄膜的制备与研究工作。E-mail: jzshao@mail.ustc.edu.cn
  • 基金资助:

    Anhui Provincial Natural Science Foundation (090414169), Anhui Provincial International Science and Technology Cooperation Program (10080703021)

Characterization of Mo-doped ZnO thin films prepared by the sol–gel method

SHAO Jing-Zhen1, DONG Wei-Wei1,2, TAO Ru-Hua1,2, DENG Zan-Hong1,2, ZHOU Shu, FANG Xiao-Dong1,2   

  1. 1 Anhui Provincial Key Laboratory of Photonic Devices and Materials, Anhui Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Hefei 230031, China;
     2 Key Laboratory of New Thin Film Solar Cells, Institue of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China)
  • Online:2011-03-03

摘要:

利用溶胶凝胶法在Al2O 3衬底上制备出了c轴择优取向的钼掺杂氧化锌(MZO)透明导电薄膜,研究了钼的掺杂量(0~1 at%)对钼掺杂氧化锌薄膜光电性能的影响。研究结果表明:所制备的薄膜为六方纤锌矿型结构且表面平整、致密,通过高温真空退火,MZO薄膜的电阻率明显降低,且随着钼含量的增加,MZO薄膜的电阻率呈现出先减小后增大的趋势,当钼含量为0.4at.%时,获得最小电阻率为0.13 Ωcm。薄膜在近红外区域(800~2000 nm)的平均透过率大于85%,这可以有效地拓宽光电器件的光谱范围。

关键词: 材料, 光电特性, 溶胶凝胶法, 钼掺杂氧化锌, 透明导电氧化物

Abstract:

Mo-doped ZnO (MZO) films with different Mo concentration (0~1 at%) were prepared on Al2O3 (0001) substrates by sol-gel spin coating route. It was found that the MZO films with the ZnO hexagonal wurtzite structure were highly c-axis orientation. The electrical properties of the MZO films could be significantly improved by the heat-treatment in vacuum. The resistivity of the films initially decreased with the increase of Mo content and then gradually increased with a further increase of Mo content. The lowest resistivity of 0.13 Ωcm was obtained at a Mo content of 0.4 at.%. The carrier concentration and the Hall mobility were measured and discussed to understand the electrical transport characteristics. The high average transmittance (>85%) in near-infrared region (800~2000 nm) indicates the possible use of MZO films in photoelectric device to widen absorption spectrum range.

Key words: materials, photoelectric properties, sol-gel spin coating method, Mo-doped zinc oxide, transparent conducting oxides