Recent advances in multilayer coatings for EUV lithography

Abstract

Abstract: Extreme Ultraviolet lithography has become the key candidate of lithography tools to manufacture devices at the 22nm node and beyond of semiconductor integrated circuit, which makes use of the extreme ultraviolet rays with 13.5nm wavelength as the light source. It is one of approaches to construct a normal incidence optical system by using the excellent performance multilayer coatings. In this paper, a review is given of the specification of the coatings for Extreme Ultraviolet lithography (EUVL) and the recent progress in multilayered systems. The key deposition methods and equipments that produce such coatings are discussed. Furthermore, in terms of high reflectance, wavelength matching, profile matching, life and stability, it also concludes the problems existed in the preparation technologies of the multilayered systems and the future direction of the development.

Key words: laser techniques, extreme ultraviolet lithography, EUV multilayer coatings, deposition method

CLC Number:

O475

Qin Juanjuan, Dong Weiwei, Zhou Shu, You Libing, Fang Xiaodong. Recent advances in multilayer coatings for EUV lithography[J]. J4, 2014, 31(1): 1-11.

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