Limit Resolution of Digital Mask Projection Lithography

Abstract

Abstract: A digital-mask projection lithography (DMPL) technology based on DMD is proposed. The femtosecond laser is used as a light source, combining with a high zoom ratio objective lens to shrink the reaction region of photoresist with photons by adjusting the light field distribution. The spatial resolution of the DMD projection lithography has been improved to submicron, and maskless projection lithography with a cross-scale processing capability (a single exposure area of over 100 μm and an exposure accuracy of hundreds nanometers) is realized. Detailed analysis of the geometry and physical optics models has been studied theoretically. We have clarified the relationship between the number of pixels and the size of the processing structure. The key technical issues of limited resolution in DMPL have been investigated based on the physical optics model.

Key words: digital-mask projective lithography, digital micromirror device, cross-scale, femtosecond laser, resolution

LIU Yuhuan1, 3, ZHAO Yuanyuan2, DONG Xianzi1, ZHENG Meiling1, . Limit Resolution of Digital Mask Projection Lithography[J]. Chinese Journal of Quantum Electronics.

References

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