Chinese Journal of Quantum Electronics

Previous Articles     Next Articles

Study and Fabrication of Beam-splitting Photodetector Film in optical networks

SHI Peng1,2,BI Jun3,ZHANG gong4,ZHANG Yushuai4,WANG Lirong1   

  1. 1 Department of Optoelectronic Engineering, Zhongshan Torch Polytechnic, Zhongshan 528436, China;2 Guangzhou Research Institute of Optics-Mechanics-Electricity Technology ,Guangzhou,510663,China;3 School of Optics and Electric Engineering, Changchun University of Science and Technology,Changchun 130022,China
  • Published:2019-05-28 Online:2019-05-14

Abstract: Beam-splitting photodetectors in optical communication network monitoring systems are used to detect the flow of optical signals and have a large number of applications in the field of communication and signals detect. In order to meet the device usage requirements, a beam-splitting photodetector film was developed.Its transmission and reflection energy splitting ration is 50:50 in the wavelength range of 1520~1620 nm with the IBAD technology.The optical constants calculation of coating material were analyzed and calculated.By establishing the error function, the error of optical constant of coated material was optimized and reduced. In the design of beam-splitting photodetector film, the spectrum curve was smoothed by adding the dummy layer, and the sensitivity of the layer thickness was reduced.As a result,the difficulty of the preparation process was reduced. The transmittance and reflection splitting ration of the prepared beam-splitting photodetector film in the wavelength range 1260~1620 nm is less than 50:50(±0.5%), which meets the requirements of the parameters.

Key words: thin film optics, beam-splitting photodetector film, dummy layer, splitting ratio