纳秒脉冲激光制备黑硅及其光学性能的研究

doi:10.3969/j.issn.1007-5461.2024.05.011

量子电子学报 ›› 2024, Vol. 41 ›› Issue (5): 813-821.doi: 10.3969/j.issn.1007-5461.2024.05.011

纳秒脉冲激光制备黑硅及其光学性能的研究

王可1,5, 王梓霖1, 周晓雨1, 黄伟其1,2*, 张铁民1, 彭鸿雁1, 王安琛2, 张茜2, 黄忠梅2,3, 刘世荣4

( 1 海南师范大学物理与电子工程学院, 海南海口 571158; 2 贵州大学材料与冶金学院, 贵州贵阳 550025; 3 复旦大学表面物理国家重点实验室, 上海 200433; 4 中国科学院地球化学研究所环境地球化学国家重点实验室, 贵州贵阳 550081; 5 中建材光子科技有限公司, 山东枣庄 277102 )

收稿日期:2022-11-10 修回日期:2022-12-12 出版日期:2024-09-28 发布日期:2024-09-28
通讯作者: E-mail: wqhuang@hainnu.edu.cn E-mail:E-mail: wqhuang@hainnu.edu.cn
作者简介:王可 ( 1996 - ), 山东枣庄人, 研究生, 主要从事硅基纳米材料、纳米硅发光等方面的研究。E-mail: 2272782176@qq.com
基金资助:
国家自然科学基金 (11847084), 贵州省科技计划重点资助项目 (黔科合-ZK[2022] 重点010)

Preparation of black silicon by nanosecond pulsed laser and its optical properties

WANG Ke 1,5 , WANG Zilin1 , ZHOU Xiaoyu1 , HUANG Weiqi 1,2*, ZHANG Tiemin1 , PENG Hongyan1 , WANG Anchen2 , ZHANG Xi 2 , HUANG Zhongmei 2,3 , LIU Shirong4

( 1 School of Physics & Electronic Engineering, Hainan Normal University, Haikou 571158, China; 2 School of Materials and Metallurgy, Guizhou University, Guiyang 550025, China; 3 State Key Laboratory of Surface Physics, Fudan University, Shanghai 200433, China; 4 State Key Laboratory of Environmental Geochemistry, Institute of Geochemistry, Chinese Academy of Sciences, Guiyang 550081, China; 5 China National Building Material Photonics Technology Co., Ltd., Zaozhuang 277102, China )

Received:2022-11-10 Revised:2022-12-12 Published:2024-09-28 Online:2024-09-28

摘要/Abstract

摘要： 利用纳秒脉冲激光器在常温常压室内环境下扫描刻蚀单晶硅片, 通过改变扫描方式和扫描的线间距制备了各种不同结构的黑硅样品, 重点研究了扫描方式、扫描间隔、高温吹氧退火时间等对黑硅光致发光 (PL) 特性的影响, 以及不同参量制备的硅表面微结构对光吸收率的影响。利用透射电子显微镜、扫描电子显微镜、光学显微镜、拉曼和荧光光谱仪、吸收光谱仪等对制备的黑硅样品形貌、光吸收和PL发光特性进行了检测与表征, 获得了吸收率高于 90%且具有良好发光性能的黑硅结构样品。研究发现, 采用线性扫描方式制备的黑硅样品的PL光谱主要分布在红光波段, 而采用正交扫描方式制备的黑硅样品的PL光谱中在近红外900 nm附近有稳定的发光峰; 此外, 在黑硅样品中还观察到630 nm附近的电子局域态发光, 并通过建立对应的物理模型解释了其发光机理。

关键词: 激光技术, 黑硅, 吹氧退火, 光致发光谱, 反射谱, 局域态发光

Abstract: A nanosecond pulse laser was used to scan and etch single crystal silicon in room temperature and atmospheric pressure environment in this work, and various black silicon samples with different structure were prepared by changing the scanning mode and scanning line spacing. Then the effects of scanning mode, scanning interval and high temperature oxygen blowing annealing time on the photoluminescence (PL) properties of black silicon were studied, as well as the effect of different microstructure of silicon surface on light absorption rate. The morphology, light absorption and PL characteristics of the prepared black silicon samples were detected and characterized using transmission electron microscopy, scanning electron microscopy, optical microscopy, Raman and fluorescence spectroscopy, absorption spectroscopy, etc., and black silicon structure samples with an absorption rate higher than 90% were obtained. It is found that the PL spectrum of black silicon samples prepared by linear scanning is mainly distributed in the red band, while the PL spectrum of black silicon samples prepared by orthogonal scanning has a stable emission peak near 900 nm. In addition, the eletron localized luminescence near 630 nm was observed on the black silicon sample, and its luminescence mechanism was explained by establishing a corresponding physical model.

Key words: laser techniques, black silicon, oxygen blowing annealing, photoluminescence spectrum; reflection spectrum, localized luminescence

中图分类号:

O433
O472

王可, 王梓霖, 周晓雨, 黄伟其, 张铁民, 彭鸿雁, 王安琛, 张茜, 黄忠梅, 刘世荣. 纳秒脉冲激光制备黑硅及其光学性能的研究[J]. 量子电子学报, 2024, 41(5): 813-821.

WANG Ke , , WANG Zilin , ZHOU Xiaoyu , HUANG Weiqi , ZHANG Tiemin , PENG Hongyan , WANG Anchen , ZHANG Xi , HUANG Zhongmei , , LIU Shirong. Preparation of black silicon by nanosecond pulsed laser and its optical properties[J]. Chinese Journal of Quantum Electronics, 2024, 41(5): 813-821.

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纳秒脉冲激光制备黑硅及其光学性能的研究

Preparation of black silicon by nanosecond pulsed laser and its optical properties

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